Joint Appointment

• Department of Electrical and Computer Engineering
• Institute for Research in Electronics and Applied Physics

Research

• Focused Ion Beam (FIB) nanofabrication: devices, materials and process development

Recent Topics

• Focused ion beam (FIB) nanofabrication
• Electrical contacts to nanofibers and nanotubes by FIB
• Beam induced deposition and etching
• Patterning of graphene

Teaching

• Introduced and developed courses:
  
  • ENEE 719A "Nanostructure Fabrication"
  • ENEE 416 "Integrated Circuit Fabrication" (lecture and lab)
• Other courses taught more than once:
  • ENEE 600 "Solid State Electronics" (graduate core course)
  • ENEE 313 "Semiconductor Device Physics"
  • ENEE 480 "Fundamentals of Solid State Electronics"

Education

• BS, MS, PhD in Physics, Carnegie Mellon University

Awards

• Fellow of IEEE

Books Edited

• John Melngailis, Proceedings of "44th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication" (American Institute of Physics, 2000).

• John Melngailis, K. Gamo, J. Orloff, editors, "Japan/U.S. Workshop on Formation of Ion Nanobeams and Applications to Materials Processing (American Institute of Physics, 1998).

Selected Recent Publications

• I. Utke, P. Hoffmann, and J. Melngailis, (review article), "Gas assisted focused electron beam and ion beam processing and fabrication," J. Vac. Sci. Technol. B26, 1198 (2008). (PDF)

• Abhishek Motayed, A. Davydov, S. N. Mohammad, J. Melngailis, "Experimental investigation of electron transport properties of gallium nitride nanowires," J. Appl. Phys. 104 [2], 024302 (2008). (PDF)

• Abhished Motayed, A. Davydov, M. Q. He, S. N. Mohammad, and J. Melngailis, "365 nm operation of n-nanowire/p-gallium nitride homojunction light emitting diodes," Appl. Phys. Lett. 90 [18], 183120 (2007). (PDF)

• J. D. Barry, M. Erwin, J. Molstad, A. Wickenden, T. Brintlinger, P. Hoffmann, and J. Melngailis, "Electron beam induced deposition of low resistivity platinum from Pt(PF3)4," J. Vac. Sci. Technol. B24, 3165 (2006). (PDF)

• W. Jeon, T. Firestone, J. Rodgers, and J. Melngailis, "On-chip RF pulse power detector using FIB as a post-CMOS fabrication process," Electromagnetics 26 [1], 103 (2006). (PDF)

• Anthony De Marco, William Bandy, Sia Parsa, Henry Kaufman, and John Melngailis, "Writing the identity in RFID tags with focused ion beam implantation of transistor gates," J. Vacuum Sci. Technol. B23, 2811 (2005). (PDF)

• T. Brintlinger, M. S. Fuhrer, John Melngailis, T. Bret, I. Utke, P. Hoffmann, P. Doppelt, and M. Abourida, "Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold," J. Vacuum Sci. Technol. B23, 3174 (2005). (PDF)

• Woochul Jeon, Todd M. Firestone, John C. Rodgers, and John Melngailis, "Design and fabrication of Schottky diode, on-chip RF power detector," Solid State Electron. 48, 2089 (2004). (PDF)

• Anthony J. De Marco and John Melngailis, "Maskless fabrication of JFETs via focused ion beams," Solid State Electron. 48, 1833 (2004). (PDF)

• Anthony De Marco and John Melngailis, "Lateral growth of focused ion beam d eposited platinum for stencil mask repair," J. Vacuum Sci. Technol. B17 [6], 3154 (1999).

Recent Conference Presentations

• "Focused ion beam nanofabrication - new possibilities," (Invited) EIPBN 2010, (Electron Ion and Photon Beam Technology and Nanofabrication) (Anchorage, May 2010).

• "Focused ion beam and electron beam nanofabrication," (Invited) XVIII International Materials Research Congress, (IMRC, Cancun, Mexico, 2009).

• "High speed focused ion (and electron) beam nanofabrication," (Invited), American Physical Society Conference (Pittsburgh, March 2009).

Related Site: Maryland NanoCenter