|Focused ion beams are widely used for the mask repair, implantation, milling, deposition and secondary electron/ion imaging. FIB provides unique capabilities for new prototype device modification, fundamental study of the ion/surface interaction, and much more. Focused ion beams are the main profile of the Laboratory for Ion Beam Research and Applications, University of Maryland.|
An example, the Micrion FIB-2500 (pictured), has 5 nm ion beam column, a liquid Ga ion source and an accelerating voltage up to 50 kV. This precise instrument has been used to fabricate a number of submicron structures for different applications.
|FIB was recently used to fabricate submicron ferroelectric capacitor structures with a size down to 0.01 µm2.
Ion beam scans the surface in a choosen pattern resulting in the material removal. The milling process in motion of a multilayer thin film structure, and the resulting pattern, are shown in these pictures.
The size of the moving image is 3x3 µm.
|FIB milled tip in a CVD diamond microcrystal. The tip height is ~400 nm, and a radius is ~40 nm.|
|Note: by clicking this button you will leave the LIBRA's Web site. Click the link to the Laboratory for Ion Beam Research and Application in the Andrei Stanishevsky's Main Page to return.|